Microwave Materials Science Workstation - Microwave Plasma Chemical Vapor Deposition System

Main purpose:
This system can be used as both traditional chemical vapor deposition equipment and microwave energy chemical vapor deposition equipment, as well as microwave plasma chemical vapor deposition equipment
★ Mainly applied in the fields of semiconductors, large-scale insulation materials, most metal materials and metal alloy materials, new materials and processes such as graphene, nanomaterials, carbon fibers, silicon carbide, coating, etc
This product has excellent properties such as high ionization, high electron temperature and electron density, wide applicable pressure range, and no internal electrode contamination. Microwave plasma is used for material surface treatment, diamond film preparation
Chemical vapor deposition, etching and methane conversion to hydrogen, long afterglow luminescent materials, ceramic sintering, carbon nanotube modification [3], nano powder synthesis, water pollution treatment and other fields

Product features:
★The design of a vertical reactor can achieve high plasma density; A symmetrical microwave generator device that produces a more uniform plasma environment
★There are no internal electrodes inside the resonant cavity, which can avoid pollution caused by electrode discharge. Moreover, its operating pressure range is relatively wide, resulting in high plasma density and large area,
High stability and no contact with the vacuum chamber, thus avoiding contamination of the film by the chamber wall
★Easy to operate:The gas path connection method adopts KF quick connection flange structure, which simplifies the process of picking up and placing materials. Only one clamp is needed to complete the gas path connection, which is convenient for operation,
Cancelled the complex flange installation process, reducing damage caused by installation
★multi-function:Four heating methods are available: microwave plasma, pure microwave, traditional electric heating, and hybrid heating; Adapt to heat treatment of any non flammable sample, including metals and alloys
★Dual temperature zone structure:Upper plasma zone or heating zone, lower sample stage heating zone
★Exclusive developed microwave field specific sensor for precise temperature control
★Safety:Exclusive use of interlocking protection shielding measures to prevent leakage, safe and reliable microwave shielding cavity design, multiple anti leakage protections
*Equipped with professional microwave suppressors as standard
*Built in microwave leakage sensor
★Energy saving:Long service life: Magnetron microwave heating avoids and solves the problem of traditional heating elements such as heating wires, silicon carbon rods, and silicon molybdenum rods being easily damaged, and also avoids the problem of heating elements being damaged
Various losses caused by damage, including time, experimental progress, repair costs, etc
★ Adopting stepless adjustability, high stability and long service lifeContinuous wave micro wave sourceEnsure that the equipment can operate continuously and stably for a long time
★Embedded microcomputer integrated temperature control system; Realize stable temperature control
★ No need for oven drying process: The entire furnace chamber generates heat by itself, and the heating is uniform
★ Microwave energy is available immediately, without thermal inertia, and easy to control temperature
★ Equipped with swivel wheel adjustable feet for easy movement and fixation

Technical parameters:

Model/model	WBDQC-4
Heatable material	Any material that is not flammable or explosive
microwave frequency	2.45GHZ±50MHz
Heating method	Plasma heating, pure microwave heating, traditional electric heating, mixed heating
Maximum power/KW (continuous, adjustable)	4
Sample cavity length	Standard 100mm can be customized according to user needs
Heating sample chamber (material)	Quartz tube (microwave plasma working mode)	Quartz tube&corundum tube (other heating methods)
Temperature control range/℃	1100 ℃ quartz sample cavity diameter: available in Φ 45mm, Φ 60mm, and Φ 100mm;	1500 ℃ corundum sample cavity diameter: optional for Φ 45mm and Φ 60mm;
Temperature testing component	Microwave field specific sensor
Temperature resolution/℃	0.1
Maximum temperature range of sample stage	Room temperature -1200 ℃, optional for higher temperatures
Temperature control accuracy/℃	± 1 below 1200 ℃; Above 1200 ℃ ± 2 ℃
Temperature deviation/℃
Temperature stability fluctuation/℃
Cooling method	forced air cooling
Length of constant temperature zone/mm	Standard 100mm can be customized according to user needs
Heating rate (standard)	0-200 ℃/min (excluding microwave plasma working mode) Arbitrary setting, programmable, segmented heating
Temperature control method	10 segments with adjustable process parameters, 7-inch touch screen operation, and data storage function; Provide manual, automatic, and constant temperature control modes, with real-time curve display
control gas	Control gases: H2, CH4, Ar, N2, other gases optional
flow control	Standard configuration includes 2 sets of quality flow controllers: Seven Star Huachuang (with vacuum protection valve at the rear, matched with vacuum mode); Accuracy: 0.8%
Maximum withstand voltage	1MPa； Control response time: 10ms
Vacuum system vacuum pump	RVP2008； Pressure range: 10-3 Torr~760 Torr Maximum pumping speed: 8.5m3/h
vacuum gauge	Digital vacuum gauge: 1atm-10-1 Pa
standard configuration	The quality flow automatic control system is equipped with a control computer and control software, which can display and save growth parameters in real-time
Other configurations of the gas path	Gas cabinets, gas circuits, and valves, etc
port	Stainless steel KF50 flange interface
Power supply voltage (V)	220
Microwave leakage rate/mW/cm2	≤0.4
Dimensions (length, width, height)/mm	1100×750×1900

Optional features:
Quality flow control system; Alicat Quality Flow&Controller from the United States