new-typePlasmaPro1000 Astrea etching equipmentThe device can be PSS, GaN and AlGaInP provide solutions for large-scale etching, which helps HBLED manufacturers improve yield and reduce user costs.

This device can batch etch chips ranging from 55 x 2 "to 3 x 8", and its unique design meets the stringent chemical requirements of HBLED materials. PlasmaPro1000 Astrea has low losses and high output to ensure maximum optical output of customer chips.

The high configuration of this device is reflected in the fact that the processing chamber can be configured as an independent module or cluster, or upgraded to a four sided cluster device to support three production modules.

To ensure high operational efficiency and ease of maintenance of the device, its main features and advantages include:

• Industry leading, capable of handling plasma sources with a diameter of 690mm and high uniformity requirements.

• A 490mm electrode can process 55x2 "in large quantities, 14x4”, Chips ranging from 7x6 "to 3x8" in size

• High conductivity pump system

• Dual air intakes make process adjustments smoother

• Provide large fixtures for chip cooling

• The Z-shaped movement ensures excellent uniformity of the chip

• Hardware stability and ease of maintenance ensure optimal uptime